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School of Arts & Sciences Hajim School of Engineering & Applied SciencesIntegrated Nanosystems Center

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Facilities

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Equipment

Cleanroom

  • Atomic Layer Deposition Tool: Veeco/Cambridge NanoTech S200
  • CVD/Plasma Oven: YES 1224P
  • Cross Section Polisher: JEOL IB-19530CP
  • Dicing Saw: Disco DAD3221
  • Drying Ovens: ShelLab
  • Laserwriter: Microtech LW405C
  • Light Microscope: Nikon Optiphot
  • Light Microscope: Olympus BX60
  • Lithography Bench with Spin Coaters: Laurell WS-650
  • Mask Aligner: OAI Model 200
  • Hybrid Sputter-Evaporation Tool: Lesker PVD-75 (PVDa)
  • Straight Sputtering-Thermal Evaporation Tool: Lesker PVD-75 (PVDb)
  • Rapid Thermal Processor: Annealsys AS-One 150
  • RCA Clean Bench/General Acid Bench
  • Reactive Ion Etcher: South Bay Tech (SBT) Model 2000
  • Spectrometer: Filmetrics F40
  • Spin-Rinse Dryer: SemiTool
  • Sputtering Tool: AJA ATC 2000-V
  • Surface Profiler: Ambios XP200
  • Tube Furnace: Lindberg 55346
  • Wafer Probe Station: Signatone S-251-6
  • Wire Bonder: K&S Model 4123

Metrology

  • AFM: NT-MDT Solver NEXT Microscope
  • Electron Beam Lithography System: Elionix ELS-S50EX
  • Light Microscope: Olympus BX51
  • SEM/FIB: Zeiss-Auriga Microscope
  • TEM/STEM: FEI Tecnai F20 STEM Microscope
  • XPS: Kratos Axis Ultra DLD
Sample prep
  • Denton Sputtering Tools (2)
  • Ladd HV Evaporator
  • Tousimis Critical Point Dryer
  • SBT Plasma Cleaner/O2 Asher
  • SBT TEM sample prep suite (tripod)
  • RMC Ultramicrotome
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Integrated Nanosystems Center

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