Equipment
Cleanroom
- Atomic Layer Deposition Tool: Veeco/Cambridge NanoTech S200
- CVD/Plasma Oven: YES 1224P
- Cross Section Polisher: JEOL IB-19530CP
- Dicing Saw: Disco DAD3221
- Drying Ovens: ShelLab
- Laserwriter: Microtech LW405C
- Light Microscope: Nikon Optiphot
- Light Microscope: Olympus BX60
- Lithography Bench with Spin Coaters: Laurell WS-650
- Mask Aligner: OAI Model 200
- Hybrid Sputter-Evaporation Tool: Lesker PVD-75 (PVDa)
- Straight Sputtering-Thermal Evaporation Tool: Lesker PVD-75 (PVDb)
- Rapid Thermal Processor: Annealsys AS-One 150
- RCA Clean Bench/General Acid Bench
- Reactive Ion Etcher: South Bay Tech (SBT) Model 2000
- Spectrometer: Filmetrics F40
- Spin-Rinse Dryer: SemiTool
- Sputtering Tool: AJA ATC 2000-V
- Surface Profiler: Ambios XP200
- Tube Furnace: Lindberg 55346
- Wafer Probe Station: Signatone S-251-6
- Wire Bonder: K&S Model 4123
Metrology
- AFM: NT-MDT Solver NEXT Microscope
- Electron Beam Lithography System: Elionix ELS-S50EX
- Light Microscope: Olympus BX51
- SEM/FIB: Zeiss-Auriga Microscope
- TEM/STEM: FEI Tecnai F20 STEM Microscope
- XPS: Kratos Axis Ultra DLD